METHOD AND APPARATUS FOR GAS FLOW MEASUREMENT

• Main Authors: GOLD EZRA ROBERT, CRUSE JAMES PATRICK, LEE JARED AHMAD, FOVELL RICHARD CHARLES, ZHANG CHUNLEI
• Format: Patent
• Language: English; Korean
• Published: 19.08.2010
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; MEASURING; MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL; METERING BY VOLUME; PHYSICS; SEMICONDUCTOR DEVICES; TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TESTING

PURPOSE: A gas flow measurement apparatus and method are provided to prove the flow rate and pressure of gas entering a sensing circuit based on the properties measured from gas within the authorized volume. CONSTITUTION: A gas flow measurement apparatus comprises a gas source(102), a switching valve(106), an adjusting device, an orifice(108), and a sensing circuit(146). The switching valve has inlets, a first outlet, and a second outlet. The switching valve interlinks a process chamber to the second outlet. The adjusting device is connected by fluid between the inlet of the switching valve and the gas source. The orifice is connected by fluid in the first outlet of the switching valve and has the same flow resistance as the process chamber. The sensing circuit receives the flow passing through the orifice.