OPTICAL APPARATUS FOR PLASMA

PURPOSE: An optical apparatus for plasma is provided to measure the spatial distribution of plasma emitted light by regulating the distance between a light receiving lens and a pin-hole. CONSTITUTION: A light receiving lens(110) receives optical emission spectrum from plasma. A first aperture is arr...

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Bibliographic Details
Main Authors HAHN, JAE WON, CHAE, SEUNG KI, OH, CHANG HOON, YI, HUN JUNG
Format Patent
LanguageEnglish
Korean
Published 19.08.2010
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: An optical apparatus for plasma is provided to measure the spatial distribution of plasma emitted light by regulating the distance between a light receiving lens and a pin-hole. CONSTITUTION: A light receiving lens(110) receives optical emission spectrum from plasma. A first aperture is arranged between the light receiving lens and the plasma to block out-focused light. A second aperture is arranged between the light receiving lens and the phase forming region of the light receiving lens to block in-focused light. A pin-hole is arranged in the phase forming region of the light receiving lens to limit the depth of focus with respect to a target region.
Bibliography:Application Number: KR20090010547