METHOD AND APPARATUS FOR REPAIRING AN ELECTROSTATIC CHUCK DEVICE, AND THE ELECTROSTATIC CHUCK DEVICE
PURPOSE: An electrostatic chuck device and a method for repairing the same are provided to prevent the non-uniformity of thermal conductive of an adhesive layer after a repairing process by uniformly repairing the eroded absorbing layer and adhesive layer. CONSTITUTION: A wafer is absorbed on the up...
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Main Authors | , , |
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Format | Patent |
Language | English Korean |
Published |
22.07.2010
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Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE: An electrostatic chuck device and a method for repairing the same are provided to prevent the non-uniformity of thermal conductive of an adhesive layer after a repairing process by uniformly repairing the eroded absorbing layer and adhesive layer. CONSTITUTION: A wafer is absorbed on the upper side of an absorbing layer(23). The absorbing layer is made of an insulation resin sheet and ceramic with an electrode. A rotation unit(11) rotates an electrostatic chuck device(20). A bobbin(12) supplies a string type adhesive(14) to an adhesive layer(22). A position determining unit determines the position of the adhesive between a bobbin and the adhesive layer. |
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Bibliography: | Application Number: KR20100003242 |