METHOD AND APPARATUS FOR REPAIRING AN ELECTROSTATIC CHUCK DEVICE, AND THE ELECTROSTATIC CHUCK DEVICE

PURPOSE: An electrostatic chuck device and a method for repairing the same are provided to prevent the non-uniformity of thermal conductive of an adhesive layer after a repairing process by uniformly repairing the eroded absorbing layer and adhesive layer. CONSTITUTION: A wafer is absorbed on the up...

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Bibliographic Details
Main Authors YOSHIOKA KEN, SASAKI YASUHARU, TAKAHASHI SYUICHI
Format Patent
LanguageEnglish
Korean
Published 22.07.2010
Subjects
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Summary:PURPOSE: An electrostatic chuck device and a method for repairing the same are provided to prevent the non-uniformity of thermal conductive of an adhesive layer after a repairing process by uniformly repairing the eroded absorbing layer and adhesive layer. CONSTITUTION: A wafer is absorbed on the upper side of an absorbing layer(23). The absorbing layer is made of an insulation resin sheet and ceramic with an electrode. A rotation unit(11) rotates an electrostatic chuck device(20). A bobbin(12) supplies a string type adhesive(14) to an adhesive layer(22). A position determining unit determines the position of the adhesive between a bobbin and the adhesive layer.
Bibliography:Application Number: KR20100003242