EXPOSURE APPARATUS AND METHOD TO MEASURE ORTHOGONALITY THEREOF

PURPOSE: An exposing device and a method for measuring orthogonality thereof are provided to measure and correct the orthogonality of a stage by using an optical unit installed on the exposing device without an additional measuring device. CONSTITUTION: A stage(18) transfers a substrate. An optical...

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Bibliographic Details
Main Authors PARK, SANG HYUN, BAEK, DONG SEOK, BAE, SANG WOO, LEE, HI KUK, JANG, SANG DON, KIM, UI TAE
Format Patent
LanguageEnglish
Korean
Published 22.07.2010
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: An exposing device and a method for measuring orthogonality thereof are provided to measure and correct the orthogonality of a stage by using an optical unit installed on the exposing device without an additional measuring device. CONSTITUTION: A stage(18) transfers a substrate. An optical unit(66) generates a plurality of beams irradiated to a substrate. A controller(63) exposes a plurality of beams on the exposed part of the substrate while moving the stage. The orthogonality of the stage is measured by using the exposed result. A beam distance measuring unit(26) measures the distance between a plurality of exposed beams.
Bibliography:Application Number: KR20090002840