SELF-ASSEMBLED SIDEWALL SPACER

A semiconductor structure is provided that includes a spacer directly abutting a topographic edge of at least one patterned material layer. The spacer is a non-removable polymeric block component of a self-assembled block copolymer. A method of forming such a semiconductor structure including the in...

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Bibliographic Details
Main Authors RADENS CARL JOHN, DORIS BRUCE
Format Patent
LanguageEnglish
Korean
Published 01.07.2010
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A semiconductor structure is provided that includes a spacer directly abutting a topographic edge of at least one patterned material layer. The spacer is a non-removable polymeric block component of a self-assembled block copolymer. A method of forming such a semiconductor structure including the inventive spacer is also provided that utilizes self-assembled block copolymer technology.
Bibliography:Application Number: KR20107006345