IMPROVED SILICON CARBIDE PARTICLES, METHODS OF FABRICATION, AND METHODS USING SAME

Improved silicon carbide particles, improved silicon carbide abrasive particles, and abrasive slurry compositions for use chemical mechanical planarization (CMP) processes, the particles can comprise nano-sized carbide particles, particularly silicon carbide particles having a surface chemistry simi...

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Bibliographic Details
Main Authors BAKSHI ABHAYA K, CHERIAN ISAAC K
Format Patent
LanguageEnglish
Korean
Published 23.06.2010
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Summary:Improved silicon carbide particles, improved silicon carbide abrasive particles, and abrasive slurry compositions for use chemical mechanical planarization (CMP) processes, the particles can comprise nano-sized carbide particles, particularly silicon carbide particles having a surface chemistry similar to silica.
Bibliography:Application Number: KR20107007976