SOLAR CELL WAFER DETERGENT COMPOSITION
PURPOSE: A solar cell wafer detergent composition is provided to have excellent detergency for each cut wafer and to obtain superior cleaning effect by preventing the generation of wafer etching due to washed residue. CONSTITUTION: A solar cell wafer detergent composition includes one or a mixture w...
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Main Authors | , , , |
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Format | Patent |
Language | English Korean |
Published |
10.06.2010
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Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE: A solar cell wafer detergent composition is provided to have excellent detergency for each cut wafer and to obtain superior cleaning effect by preventing the generation of wafer etching due to washed residue. CONSTITUTION: A solar cell wafer detergent composition includes one or a mixture which is selected from a group comprising glycol ether compound, alcohol compound, and a surfactant. The surface tension of the detergent composition is 20~60 dyne/cm. The glycol ether compound is the glycol ether compound or a mixture which is marked as a chemical formula 1 or a chemical formula 2. The chemical formula 1 is C_6H_5-CH_2O-(CH_2CH_2O)_m(CH_2CHCH_3O)_n-H. The chemical formula 2 is R-O-(CH_2CH_2O)_m(CH_2CHCH_3O)n-H. |
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Bibliography: | Application Number: KR20080120530 |