METHOD AND SEMICONDUCTOR MANUFACTURING SYSTEM FOR DETECTING BAD WAFER USING STANDARD DATABASE OPTICAL CRITICAL DIMENSION

• Main Author: HAN, DONG HYUN
• Format: Patent
• Language: English; Korean
• Published: 20.05.2010
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

PURPOSE: A method for detecting a bad wafer using a data-based standard optical critical dimension and a system for manufacturing a semiconductor using the same are provided to improve productivity by omitting subsequent processes with respect to the bad wafer. CONSTITUTION: A wafer is loaded in a m...