EXPOSURE APPARATUS

PURPOSE: An exposure apparatus is provided to minimize the apparatus without moving an alignment stage to the XY direction, to reduce the number of alignment microscopes, and to reduce the cost of the apparatus. CONSTITUTION: An exposure apparatus comprises an alignment stage unit(22), an exposure p...

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Bibliographic Details
Main Authors SATO YOSHIHIKO, INOUE TOYOHARU
Format Patent
LanguageEnglish
Korean
Published 19.05.2010
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: An exposure apparatus is provided to minimize the apparatus without moving an alignment stage to the XY direction, to reduce the number of alignment microscopes, and to reduce the cost of the apparatus. CONSTITUTION: An exposure apparatus comprises an alignment stage unit(22), an exposure processor(21) and a work transfer device(23). The alignment stage unit includes the following: an alignment stage(AS) maintaining a walk(W) formed with an alignment mark; an alignment microscope(4) for detecting the walk and the alignment mark; and a stage/microscope transport device(22a) moving the alignment microscope and the alignment stage to a first axis direction by the width of the walk. The exposure processor comprises a mask/alignment mask detecting microscope(10), and an exposure stage(WS).
Bibliography:Application Number: KR20090089512