PATTERN CLEANING METHOD AND PATTERN CLEANING DEVICE

PURPOSE: A method and a device for cleaning a pattern are provided to remove a non-uniform pattern from a substrate by applying optical-near-field photo-dissociation to a roughened part of the pattern. CONSTITUTION: A substrate, on which a pattern is formed, is located in a chamber. A reaction gas i...

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Bibliographic Details
Main Authors YANG, MIN YANG, KANG, BONG CHUL
Format Patent
LanguageEnglish
Korean
Published 17.05.2010
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A method and a device for cleaning a pattern are provided to remove a non-uniform pattern from a substrate by applying optical-near-field photo-dissociation to a roughened part of the pattern. CONSTITUTION: A substrate, on which a pattern is formed, is located in a chamber. A reaction gas is injected into the chamber(S100). A laser with photo energy is radiated onto the substrate. Optical-near-field photo-dissociation is applied on the rough surface of a pattern. The optical-near-field photo-dissociation vibrates the reaction gas. The reaction gas physically or chemically interacts with the roughened part of the pattern(S200).
Bibliography:Application Number: KR20080110241