PATTERN TRANSFER METHOD AND PATTERN TRANSFER SYSTEM

PURPOSE: A method and a system for transferring a pattern are provided to form transfer patterns on a substrate with various pattern gap by performing a re-transferring process after a transferring process is performed. CONSTITUTION: A first interference pattern is formed on a photosensitive glass(S...

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Bibliographic Details
Main Authors YANG, MIN YANG, KANG, BONG CHUL
Format Patent
LanguageEnglish
Korean
Published 17.05.2010
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A method and a system for transferring a pattern are provided to form transfer patterns on a substrate with various pattern gap by performing a re-transferring process after a transferring process is performed. CONSTITUTION: A first interference pattern is formed on a photosensitive glass(S100). A second interference pattern is formed on the photosensitive glass to be partially overlapped with the first interference pattern(S200). A thermal treatment is performed to the photosensitive glass in order to color the first and the second interference pattern(S300). A photovoltaic conversion layer and a first transfer material layer are successively formed on the photosensitive glass(S400). A first pattern is formed on a substrate by transferring the transfer material to the substrate(S500). The transfer material is re-deposited on the photovoltaic conversion layer in order to form a second transfer material layer(S600). The transfer material is transferred to the substrate in order to form a second patter(S700).
Bibliography:Application Number: KR20080110236