RESIN SOLUTION FOR THERMAL IMPRINT, RESIN THIN FILM FOR THERMAL IMPRINT, METHODS FOR PRODUCTION OF THE RESIN SOLUTION AND THE RESIN THIN FILM

• Main Authors: NAGAI GO, MITRA ANUPAM, KUSUURA TAKAHISA, TAKAYA YOSHIAKI, HAYASHIDA YOSHIHISA, SATSUKA TAKURO
• Format: Patent
• Language: English; Korean
• Published: 13.05.2010
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; CHEMISTRY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; PERFORMING OPERATIONS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; SPRAYING OR ATOMISING IN GENERAL; THEIR PREPARATION OR CHEMICAL WORKING-UP; TRANSPORTING; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Disclosed are: a resin solution substantially applicable to a thermal imprint process; a thin film produced from the resin solution; a method for producing the resin solution; and a method for producing the thin film. Specifically disclosed is a resin solution for thermal imprint, which is intended to be used for forming a thin film for thermal imprint. The resin solution comprises a thermoplastic resin and at least one solvent capable of dissolving the resin, and is so prepared as to contain foreign matters each having a particle size of 0.2 μm or larger in an amount of less than 3000 particles/cm. A thin film is formed from the resin solution, and is so prepared as to have a residual volatile content of 0.25% or less.