EUV RADIATION SOURCE

A radiation source comprising a chamber and a supply of a plasma generating substance, the source having an interaction point at which the plasma generating substance introduced into the chamber may interact with a laser beam and thereby produce a radiation emitting plasma, wherein the source furthe...

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Main Authors IVANOV VLADIMIR VITALEVITCH, BANINE VADIM YEVGENYEVICH
Format Patent
LanguageEnglish
Korean
Published 12.05.2010
Subjects
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
X-RAY TECHNIQUE
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Abstract A radiation source comprising a chamber and a supply of a plasma generating substance, the source having an interaction point at which the plasma generating substance introduced into the chamber may interact with a laser beam and thereby produce a radiation emitting plasma, wherein the source further comprises a conduit arranged to deliver a buffer gas into the chamber, the conduit having an outlet which is adjacent to the interaction point.
AbstractList A radiation source comprising a chamber and a supply of a plasma generating substance, the source having an interaction point at which the plasma generating substance introduced into the chamber may interact with a laser beam and thereby produce a radiation emitting plasma, wherein the source further comprises a conduit arranged to deliver a buffer gas into the chamber, the conduit having an outlet which is adjacent to the interaction point.
Author IVANOV VLADIMIR VITALEVITCH
BANINE VADIM YEVGENYEVICH
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Snippet A radiation source comprising a chamber and a supply of a plasma generating substance, the source having an interaction point at which the plasma generating...
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SubjectTerms ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
X-RAY TECHNIQUE
Title EUV RADIATION SOURCE
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