EUV RADIATION SOURCE

A radiation source comprising a chamber and a supply of a plasma generating substance, the source having an interaction point at which the plasma generating substance introduced into the chamber may interact with a laser beam and thereby produce a radiation emitting plasma, wherein the source furthe...

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Bibliographic Details
Main Authors IVANOV VLADIMIR VITALEVITCH, BANINE VADIM YEVGENYEVICH
Format Patent
LanguageEnglish
Korean
Published 12.05.2010
Subjects
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
X-RAY TECHNIQUE
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Summary:A radiation source comprising a chamber and a supply of a plasma generating substance, the source having an interaction point at which the plasma generating substance introduced into the chamber may interact with a laser beam and thereby produce a radiation emitting plasma, wherein the source further comprises a conduit arranged to deliver a buffer gas into the chamber, the conduit having an outlet which is adjacent to the interaction point.
Bibliography:Application Number: KR20107003754