CURABLE COMPOSITION FOR OPTICAL IMPRINTS AND PATTERNING METHOD USING SAME

• Main Authors: HATAKEYAMA AKIRA, TAKAYANAGI TAKASHI, YONEZAWA HIROYUKI
• Format: Patent
• Language: English; Korean
• Published: 11.05.2010
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

PURPOSE: A curable composition for an optical imprint and a pattern formation method using thereof are provided to prevent a pattern formed on a substrate from combining, and to offer a cured material with an improved surface. CONSTITUTION: A curable composition contains a photo-polymerizable monome...