CURABLE COMPOSITION FOR OPTICAL IMPRINTS AND PATTERNING METHOD USING SAME

PURPOSE: A curable composition for an optical imprint and a pattern formation method using thereof are provided to prevent a pattern formed on a substrate from combining, and to offer a cured material with an improved surface. CONSTITUTION: A curable composition contains a photo-polymerizable monome...

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Bibliographic Details
Main Authors HATAKEYAMA AKIRA, TAKAYANAGI TAKASHI, YONEZAWA HIROYUKI
Format Patent
LanguageEnglish
Korean
Published 11.05.2010
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:PURPOSE: A curable composition for an optical imprint and a pattern formation method using thereof are provided to prevent a pattern formed on a substrate from combining, and to offer a cured material with an improved surface. CONSTITUTION: A curable composition contains a photo-polymerizable monomer and a photo polymerization initiator. A pattern formation method using the composition comprises the following: forming a pattern forming layer by applying the curable composition for an optical imprint on a material; pressing a mold to the surface of the pattern forming layer; and irradiation a light to the pattern forming layer.
Bibliography:Application Number: KR20090103362