SUBSTRATE PROCESSING APPARATUS

PURPOSE: A substrate processing apparatus is provided to improve the heat transfer efficiency of a substrate by elevating the substrate in a chamber and loading the substrate on a heater. CONSTITUTION: A space for processing a substrate(S) is formed in a chamber(10). The entrance of the substrate is...

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Bibliographic Details
Main Authors KIM, HYUNG JUN, HUR, HYUN KANG, LEE, BYUNG WOO
Format Patent
LanguageEnglish
Korean
Published 30.04.2010
Subjects
BASIC ELECTRIC ELEMENTS
CONVEYING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
HANDLING THIN OR FILAMENTARY MATERIAL
PACKING
PERFORMING OPERATIONS
PNEUMATIC TUBE CONVEYORS
SEMICONDUCTOR DEVICES
SHOP CONVEYOR SYSTEMS
STORING
TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING
TRANSPORTING
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Summary:PURPOSE: A substrate processing apparatus is provided to improve the heat transfer efficiency of a substrate by elevating the substrate in a chamber and loading the substrate on a heater. CONSTITUTION: A space for processing a substrate(S) is formed in a chamber(10). The entrance of the substrate is formed on one side wall of the chamber and the exit of the substrate is formed on the other side wall of the chamber. A gas supply unit(14) is installed on the upper side of the chamber. The gas supply unit supplies a source gas and a reaction gas. A plurality of holders(51) is installed on the lower side of the chamber. A plurality of rollers(52) transfers the substrate. A roller driving unit rotates the rollers.
Bibliography:Application Number: KR20080103804