METHOD AND SYSTEM FOR TRANSFERRING PATTERN

PURPOSE: A method and a system for transferring a pattern are provided to adjust the gap between patterns which is transferred on a substrate by changing the radiation amount or the incident angle of laser. CONSTITUTION: A conversion layer and a transfer material layer are successively formed on the...

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Bibliographic Details
Main Authors YANG, MIN YANG, KANG, BONG CHUL
Format Patent
LanguageEnglish
Korean
Published 16.04.2010
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A method and a system for transferring a pattern are provided to adjust the gap between patterns which is transferred on a substrate by changing the radiation amount or the incident angle of laser. CONSTITUTION: A conversion layer and a transfer material layer are successively formed on the lower side of a transparent plate(S100). The conversion layer absorbs light and generates heat. The lower side of the transparent plate is opposed to a substrate in order to form a pattern transfer plate(S200). Light is radiated on the upper side of the transparent plate in order to generate optical interference. Due to the optical interference, the transfer material is transferred to the substrate(S300). The incident angle of the light is changed to adjust the pattern gap of the transfer material.
Bibliography:Application Number: KR20080098810