SEMICONDUCTOR APPARATUS, SUBSTRATE DESIGN METHOD, AND SUBSTRATE DESIGN APPARATUS
PURPOSE: A semiconductor apparatus, a substrate design method and a substrate design apparatus are provided to reduce the stress and the distortion to an electrode which is arranged on the peripheral of a chip by forming through holes. CONSTITUTION: A semiconductor apparatus includes a substrate(12)...
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Main Authors | , |
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Format | Patent |
Language | English Korean |
Published |
08.04.2010
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Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE: A semiconductor apparatus, a substrate design method and a substrate design apparatus are provided to reduce the stress and the distortion to an electrode which is arranged on the peripheral of a chip by forming through holes. CONSTITUTION: A semiconductor apparatus includes a substrate(12) and a semiconductor chip which is loaded on the substrate. A plurality of through holes(21a) are arranged on the substrate. The region of the substrate which is adjacent to the peripheral of a semiconductor chip is a first region. The number of through holes in the first region is more concentrated than the other region of the substrate. |
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Bibliography: | Application Number: KR20090091699 |