SEMICONDUCTOR APPARATUS, SUBSTRATE DESIGN METHOD, AND SUBSTRATE DESIGN APPARATUS

PURPOSE: A semiconductor apparatus, a substrate design method and a substrate design apparatus are provided to reduce the stress and the distortion to an electrode which is arranged on the peripheral of a chip by forming through holes. CONSTITUTION: A semiconductor apparatus includes a substrate(12)...

Full description

Saved in:
Bibliographic Details
Main Authors MATSUI NORIYUKI, SAKAI HIDEHISA
Format Patent
LanguageEnglish
Korean
Published 08.04.2010
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:PURPOSE: A semiconductor apparatus, a substrate design method and a substrate design apparatus are provided to reduce the stress and the distortion to an electrode which is arranged on the peripheral of a chip by forming through holes. CONSTITUTION: A semiconductor apparatus includes a substrate(12) and a semiconductor chip which is loaded on the substrate. A plurality of through holes(21a) are arranged on the substrate. The region of the substrate which is adjacent to the peripheral of a semiconductor chip is a first region. The number of through holes in the first region is more concentrated than the other region of the substrate.
Bibliography:Application Number: KR20090091699