APPARATUS AND METHOD FOR REPAIRING A MASK

PURPOSE: A mask repair apparatus and a method thereof are provided to repair a mask efficiently by using an irradiating laser to remove foreign material on the mask and digging out the foreign material with a needle. CONSTITUTION: A laser part(210) irradiates a laser on foreign material in order to...

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Main Authors PARK, JIN CHUL, YEOM, JONG SUP, LEE, JAE YONG, JO, JANG HO, KIM, KI WAN, HONG, SOK YONG, LEE, KEUN HAENG, YANG, HEE CHANG, KIM, HYUN JUNG, YANG, JEONG BOK, KIM, JUN RAE, CHO, SUNG HWAN, SHIN, GYU SUNG, PARK, NOH HEON
Format Patent
LanguageEnglish
Korean
Published 05.04.2010
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A mask repair apparatus and a method thereof are provided to repair a mask efficiently by using an irradiating laser to remove foreign material on the mask and digging out the foreign material with a needle. CONSTITUTION: A laser part(210) irradiates a laser on foreign material in order to eliminate the foreign material. A needle portion(300) applies the physical power to the foreign material so that the foreign material can be removed. An optical part(220) enables the laser to be emitted from the laser part to reach the foreign material. The material of the needle portion is comprised of tungsten. The optical part comprises a beam splitter, a lens, a filter, and a shutter.
Bibliography:Application Number: KR20080094937