NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME

PURPOSE: A nonvolatile semiconductor memory device and manufacturing method thereof improve the internal fabric of the memory device. The constant resistance between the drain section selecting transistor and the memory string are controlled. CONSTITUTION: A nonvolatile semiconductor memory device(1...

Full description

Saved in:
Bibliographic Details
Main Authors FUKUZUMI YOSHIAKI, KIDOH MASARU, TANAKA HIROYASU, KATSUMATA RYOTA, ISHIDUKI MEGUMI, KITO MASARU, KOMORI YOSUKE, AOCHI HIDEAKI
Format Patent
LanguageEnglish
Korean
Published 02.04.2010
Subjects
Online AccessGet full text

Cover

Loading…
Abstract PURPOSE: A nonvolatile semiconductor memory device and manufacturing method thereof improve the internal fabric of the memory device. The constant resistance between the drain section selecting transistor and the memory string are controlled. CONSTITUTION: A nonvolatile semiconductor memory device(100) comprises a plurality of memory strings(12) and plurality of selecting transistors. The memory string of each plurality comprises the semiconductor layer, and the charge storage layer and the first conductive layer. The semiconductor layer comprises a pair of columns and connection part. The first conductive layer functions as the control electrode of the memory cell.
AbstractList PURPOSE: A nonvolatile semiconductor memory device and manufacturing method thereof improve the internal fabric of the memory device. The constant resistance between the drain section selecting transistor and the memory string are controlled. CONSTITUTION: A nonvolatile semiconductor memory device(100) comprises a plurality of memory strings(12) and plurality of selecting transistors. The memory string of each plurality comprises the semiconductor layer, and the charge storage layer and the first conductive layer. The semiconductor layer comprises a pair of columns and connection part. The first conductive layer functions as the control electrode of the memory cell.
Author AOCHI HIDEAKI
ISHIDUKI MEGUMI
FUKUZUMI YOSHIAKI
KATSUMATA RYOTA
KOMORI YOSUKE
KITO MASARU
TANAKA HIROYASU
KIDOH MASARU
Author_xml – fullname: FUKUZUMI YOSHIAKI
– fullname: KIDOH MASARU
– fullname: TANAKA HIROYASU
– fullname: KATSUMATA RYOTA
– fullname: ISHIDUKI MEGUMI
– fullname: KITO MASARU
– fullname: KOMORI YOSUKE
– fullname: AOCHI HIDEAKI
BookMark eNqNi0sKwjAUALPQhb87PHAtpJYeICQvNpjkQUwKXZUicSVpod4fu_AArgaGmT3blKnkHbOefEdWRGMRHuiMJK-SjBTAoaPQg8LOSATh1WpiSwpIgxM-aSFjCsbfILbrKxwe2fY1vpd8-vHAzhqjbC95noa8zOMzl_wZ7uHKK8553VS8EfV_1Re24DCG
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
ExternalDocumentID KR20100035105A
GroupedDBID EVB
ID FETCH-epo_espacenet_KR20100035105A3
IEDL.DBID EVB
IngestDate Fri Aug 16 05:56:28 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
Korean
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_KR20100035105A3
Notes Application Number: KR20090087023
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100402&DB=EPODOC&CC=KR&NR=20100035105A
ParticipantIDs epo_espacenet_KR20100035105A
PublicationCentury 2000
PublicationDate 20100402
PublicationDateYYYYMMDD 2010-04-02
PublicationDate_xml – month: 04
  year: 2010
  text: 20100402
  day: 02
PublicationDecade 2010
PublicationYear 2010
RelatedCompanies KABUSHIKI KAISHA TOSHIBA
RelatedCompanies_xml – name: KABUSHIKI KAISHA TOSHIBA
Score 2.749103
Snippet PURPOSE: A nonvolatile semiconductor memory device and manufacturing method thereof improve the internal fabric of the memory device. The constant resistance...
SourceID epo
SourceType Open Access Repository
SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Title NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100402&DB=EPODOC&locale=&CC=KR&NR=20100035105A
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3fS8MwED7mFPVNp-KPKQGlb8Wu7Vr7MKRLUjq3NqO2Yz6JaTMQZRuu4r9v0m26p72FCzmSg8sl-e6-ANzlls0Lq2XpnJueroAi_SGfTPTcffM8sxAtp-ItiGInzOyncXtcg891LUzFE_pTkSNKj8qlv5fVfj3_f8QiVW7l4p6_S9HsMUg7RFvdjhX9mWFqpNuhQ0YY1jDu9BMtTpZ9CjUz2v4O7KqDtGLap6OuqkuZbwaV4Aj2hlLftDyG2sesAQd4_fdaA_ajFeQtmyvvW5zAIGbxiA38tDeg6FkZkMUkwylLUEQjlrwgQkc9TJEfEylJQ0YQC1Dkx1ng4zRTiQ8oDeVYP6KncBvQFIe6nNbrnxVe-8nmGqwzqE9nU3EOqCWtyk1eCOEI2yq4Z7q5xyeu5bjcFIVxAc1tmi63d1_B4RIwt3XDbEK9_PoW1zIOl_ymMt8v_z2E2A
link.rule.ids 230,309,786,891,25594,76906
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3fS8MwED7mFOebTsUfUwNK34pd27X2YUiXtHSuTUZNhz4N03YgyjZcxX_ftNt0T3sLF3IkB5dL8t19AbhLDVNkRttQhdAdtQSK1Id0MlFT-81x9CxvWxVvQUStIDGfXjovNfhc18JUPKE_FTmi9KhU-ntR7dfz_0csUuVWLu7FuxTNHn3eJcrqdlzSn2m6Qnpdb8gIwwrG3UGs0HjZV6JmWsfdgV275OctD0-jXlmXMt8MKv4h7A2lvmlxBLWPWRMaeP33WhP2oxXkLZsr71scQ0gZHbHQ5f3QQ8-lARklCeYsRpEXsfgVEW_Uxx5yKZESHjCCmI8ilya-i3lSJj4gHsixbuSdwK3vcRyoclrjPyuMB_HmGoxTqE9n0_wMUFtaVegiy3MrN41MOLqdOmJiG5Yt9DzTzqG1TdPF9u4baAQ8Csdhnw4u4WAJnpuqpregXnx951cyJhfiujLlL17sh8U
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=NONVOLATILE+SEMICONDUCTOR+MEMORY+DEVICE+AND+METHOD+OF+MANUFACTURING+THE+SAME&rft.inventor=FUKUZUMI+YOSHIAKI&rft.inventor=KIDOH+MASARU&rft.inventor=TANAKA+HIROYASU&rft.inventor=KATSUMATA+RYOTA&rft.inventor=ISHIDUKI+MEGUMI&rft.inventor=KITO+MASARU&rft.inventor=KOMORI+YOSUKE&rft.inventor=AOCHI+HIDEAKI&rft.date=2010-04-02&rft.externalDBID=A&rft.externalDocID=KR20100035105A