ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION AND β-DIKETONE COMPOUND
Disclosed is an alkali-developable photosensitive resin composition containing (J) a photopolymerizable unsaturated compound having a structure which is obtained by an esterification reaction between (C) a polybasic acid anhydride and a hydroxy group of a reaction product that is obtained by adding...
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Main Authors | , , |
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Format | Patent |
Language | English Korean |
Published |
11.03.2010
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Subjects | |
Online Access | Get full text |
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Summary: | Disclosed is an alkali-developable photosensitive resin composition containing (J) a photopolymerizable unsaturated compound having a structure which is obtained by an esterification reaction between (C) a polybasic acid anhydride and a hydroxy group of a reaction product that is obtained by adding (B) a compound having a β-diketone moiety or a compound having a β-ketoester group to a (meth)acryloyl group of (A) a compound having two or more (meth)acryloyl groups and a hydroxy group. As the compound having a β-diketone moiety, a novel compound that is a β-diketone compound represented by the general formula (I) below is preferably used. (In the formula (I), Rrepresents an alkyl group having 1-20 carbon atoms; Rrepresents R, OR, COR, SR, CONRRor CN; R, Rand Rindependently represent a hydrogen atom, an alkyl group having 1-20 carbon atoms or the like; a represents an integer of 0-3; and b represents an integer of 0-4.) |
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Bibliography: | Application Number: KR20097021436 |