PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS AND METHOD OF MANUFACTURING A DEVICE

PURPOSE: A miniaturized projection optical system is provided to individually perform a magnification correction in the direction in which two meets at a right angle. CONSTITUTION: A projection optical system(PO) comprises a first refractive optical unit(A) and a second refractive optical unit(B) wh...

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Bibliographic Details
Main Authors FUKAMI KIYOSHI, FUKUOKA RYOUSUKE
Format Patent
LanguageEnglish
Published 19.01.2010
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A miniaturized projection optical system is provided to individually perform a magnification correction in the direction in which two meets at a right angle. CONSTITUTION: A projection optical system(PO) comprises a first refractive optical unit(A) and a second refractive optical unit(B) which are arranged in an optical path; a first actuator driving the first refractive optical unit; and a second actuator driving the second refractive optical unit. The first refractive optical unit and second refractive optical unit are two or more cylindrical faces.
Bibliography:Application Number: KR20090059611