APPARATUS FOR COOLING A SUBSTRATE AND METHOD THEREOF

PURPOSE: An apparatus for cooling a substrate and method thereof are provided to reduce the time to be required to cooling and to improve the productivity. CONSTITUTION: The fan housing(30) silver pan(35) is included. The cooling coil(45) cools the air flowing in into the fan housing. The filter(60)...

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Bibliographic Details
Main Authors KIM, DONG KWEON, PARK, DUK JUN, PARK, KIL YOUNG, MOON, IN HO, KIM, HOI WON, KIM, JONG JIN
Format Patent
LanguageEnglish
Published 03.12.2009
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEMICONDUCTOR DEVICES
SEPARATION
TRANSPORTING
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Summary:PURPOSE: An apparatus for cooling a substrate and method thereof are provided to reduce the time to be required to cooling and to improve the productivity. CONSTITUTION: The fan housing(30) silver pan(35) is included. The cooling coil(45) cools the air flowing in into the fan housing. The filter(60) is prepared in the lower part of the fan housing and filters the air discharged from the fan housing. Provided is the cold air chamber(80) in the lower part of the filter. In the cold air chamber, the bottom wall having the opening for the clean cooling air is formed. The opening of the cold air chamber is extended according to the traveling direction of the glass substrate(10).
Bibliography:Application Number: KR20080050886