PROCESSING APPARATUS FOR WASTE GAS

PURPOSE: A waste gas processor is provided to maximize heat contact with a heater by distributing the waste gas around the heater installed in a chamber. CONSTITUTION: A heater(110) is formed in an inner side of a chamber(100) and generates the heat. A waste gas influx part(120) inputs the waste gas...

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Bibliographic Details
Main Authors LEE, HEE RYONG, KIM, MIN HYONG
Format Patent
LanguageEnglish
Published 02.12.2009
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A waste gas processor is provided to maximize heat contact with a heater by distributing the waste gas around the heater installed in a chamber. CONSTITUTION: A heater(110) is formed in an inner side of a chamber(100) and generates the heat. A waste gas influx part(120) inputs the waste gas to the chamber. A waste gas emitting unit(130) is formed in the lower side of the inflow part and emits the inputted waste gas by spraying the fluid for the waste gas. The waste gas emitting unit includes a supply tube passing through the waste gas inflow part and a spray unit spraying the fluid supplied through the supply tube. The spray unit is comprised of a plurality of spray holes(135) formed along the lower circumference of the supply tube.
Bibliography:Application Number: KR20080049583