REMOVAL OF DEPOSITION ON AN ELEMENT OF A LITHOGRAPHIC APPARATUS

The invention provides a cleaning process for the removal of deposition on an element of a lithographic apparatus. The method includes (ex situ) treating the element with an alkaline cleaning liquid. In this way, Sn may be removed from a contaminant barrier or a collector mirror. Especially benefici...

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Bibliographic Details
Main Authors KEMPEN ANTONIUS THEODORUS WILHELMUS, HOVESTAD ARJAN, VAN VLIET ROLAND EDWARD, VOORMA HARM JAN
Format Patent
LanguageEnglish
Published 12.11.2009
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
CLEANING
CLEANING IN GENERAL
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PREVENTION OF FOULING IN GENERAL
TRANSPORTING
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Summary:The invention provides a cleaning process for the removal of deposition on an element of a lithographic apparatus. The method includes (ex situ) treating the element with an alkaline cleaning liquid. In this way, Sn may be removed from a contaminant barrier or a collector mirror. Especially beneficial is the application of a voltage to the element to be cleaned and/or by using complexing agents for improving the dissolution of Sn in the cleaning liquid.
Bibliography:Application Number: KR20097018660