SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

PURPOSE: A semiconductor device is provided to increase the supply of electron number of the source to drain region and to enhance the current flow. CONSTITUTION: The semiconductor device includes the semiconductor substrate(100), the gate lines, the source area, and the source line. The semiconduct...

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Bibliographic Details
Main Author CHANG, HEON YONG
Format Patent
LanguageEnglish
Korean
Published 06.10.2009
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A semiconductor device is provided to increase the supply of electron number of the source to drain region and to enhance the current flow. CONSTITUTION: The semiconductor device includes the semiconductor substrate(100), the gate lines, the source area, and the source line. The semiconductor substrate has active area(108) in which the source predetermine region according to the first direction. The gate lines are formed on active areas arranged according to the first direction on the semiconductor substrate. The source area is formed in the source reserved area of the active area of the gate line. The source line is contacted with the source area. The source line is formed at the upper part of the active region part of the gate line in the first direction.
Bibliography:Application Number: KR20080029676