METHODE FOR REPAIRING PHOTOMASK USING DEFECT REPAIRING DEVICE

• Main Author: SONG, PAN DOL
• Format: Patent
• Language: English; Korean
• Published: 01.10.2009
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS

PURPOSE: A method for repairing photomask using defect repairing device is provided to minimize a correction error rate by performing a correction process without a beam drift phenomenon. CONSTITUTION: The method for repairing photomask using defect repairing device comprises as follows. The mask pattern(305) is formed on the transparent substrate(300). The transparent substrate is arranged on the plate(213). The generated location of a defect is measured while forming the mask pattern. Voltage is applies from the voltage impressing part to the plate to distribute(-) electric charge on the transparency plate surface. The ion caused by the correction beam(+) is ejected to correct deformity and then induced(+) ions is extracted to outside.