METHOD AND APPARATUS FOR CLEANING AND DRYING

PURPOSE: A cleaning and drying method and apparatus are provided to reduce the manufacturing cost of cleaning and drying apparatus by excluding a device shaking materials to be washed. CONSTITUTION: A cleaning and drying apparatus comprises a washing and drying room(30), a rinse solution collecting...

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Bibliographic Details
Main Authors KIM, SANG BEOM, PARK, JI AE, KIM, DEOK HUN, LEE, DONG KEE
Format Patent
LanguageEnglish
Published 30.09.2009
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Summary:PURPOSE: A cleaning and drying method and apparatus are provided to reduce the manufacturing cost of cleaning and drying apparatus by excluding a device shaking materials to be washed. CONSTITUTION: A cleaning and drying apparatus comprises a washing and drying room(30), a rinse solution collecting container(40), a vacuum evaporator(50), and a regeneration solution tank(60). An ultrasonic generator(10) and a carrier(20) for putting in materials to be washed are built in the washing and drying room. The rinse solution collecting container is located lower than the washing and drying room. The vacuum evaporator is connected to the rinse solution collecting container and receives and vaporizes the rinsing solution from the rinse solution collecting container. The regeneration solution tank stores the vaporized chlorine-based rinse solution and supplies it to the rinse solution collecting container. One end of a vacuum line(L4) in which a valve(V4) and a condenser(C1) are interposed is connected to the top of the washing and drying room. The other end of the first vacuum line is connected with a suction side of a vacuum pump(P1). One end of a second vacuum line(L5) in which a valve(V5) is interposed is connected to the outlet side of the condenser. The other end of the second vacuum line is connected to the top of the rinse solution collecting container. One end of a waste water discharge line in which a valve is interposed is connected to the top of the rinse solution collecting container. The other end of the waste water discharge line is connected to the bottom of the washing and drying room. The bottom of the rinse solution collecting container is connected to one end of the rinse solution supply line in which a circulation/supply pump and a second valves are interposed. The other end of the rinse solution supply line is connected to the top of the washing and drying room.
Bibliography:Application Number: KR20080027972