APPARATUS FOR SUPPLYING SOURCE AND METHOD FOR SUPPLYING SOURCE AND APPARATUS FOR DEPOSITIONING THIN FILM

An apparatus for supplying a raw material and a thin film depositing apparatus are provided to supply a constant amount of powder materials by measuring the weight of the powder material to be supplied to an external device. A storage(100) stores and supplies a powder material. A transfer room(200)...

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Bibliographic Details
Main Authors LEE, HYUNG SUP, LEE, KYOO HWAN, KWON, YOUNG HO
Format Patent
LanguageEnglish
Korean
Published 03.07.2009
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:An apparatus for supplying a raw material and a thin film depositing apparatus are provided to supply a constant amount of powder materials by measuring the weight of the powder material to be supplied to an external device. A storage(100) stores and supplies a powder material. A transfer room(200) includes a supply port and a transfer port. The supply port is connected to the storage and supplies the powder material. The transfer port transfers the powder material to the external device. A loading plate(310) is prepared in the transfer room and the powder material supplied through the supply port is loaded in the loading plate. A driving unit rotates the loading plate to load the powder material loaded in the loading plate. A weight sensor measures the weight of the loaded powder material in the lower part of the loading plate.
Bibliography:Application Number: KR20070141277