OPTICAL STORAGE MEDIUM COMPRISING A MASK LAYER WITH A SUPER RESOLUTION NEAR FIELD STRUCTURE

The optical storage medium according to the invention uses a mask layer (2) as a super resolution near field structure, which comprises a doped semiconductor material. The semiconductor material is n-doped particularly such that the reflectivity of the semiconductor material is increased, when irrad...

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Bibliographic Details
Main Authors PILARD GAEL, KNAPPMANN STEPHAN, FERY CHRISTOPHE, PACEARESCU LARISA
Format Patent
LanguageEnglish
Published 18.06.2009
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Summary:The optical storage medium according to the invention uses a mask layer (2) as a super resolution near field structure, which comprises a doped semiconductor material. The semiconductor material is n-doped particularly such that the reflectivity of the semiconductor material is increased, when irradiated with a laser beam. As a semiconductor material advantageously an indium alloy and as a doping material selenium or tellurium can be used. For the manufacturing of a respective optical storage medium a sputtering method for depositing the doped semiconductor material as the mask layer can be used, wherein the dopant is included already in the semiconductor sputtering target.
Bibliography:Application Number: KR20097006650