OPTICAL STORAGE MEDIUM COMPRISING A MASK LAYER WITH A SUPER RESOLUTION NEAR FIELD STRUCTURE
The optical storage medium according to the invention uses a mask layer (2) as a super resolution near field structure, which comprises a doped semiconductor material. The semiconductor material is n-doped particularly such that the reflectivity of the semiconductor material is increased, when irrad...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
18.06.2009
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Subjects | |
Online Access | Get full text |
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Summary: | The optical storage medium according to the invention uses a mask layer (2) as a super resolution near field structure, which comprises a doped semiconductor material. The semiconductor material is n-doped particularly such that the reflectivity of the semiconductor material is increased, when irradiated with a laser beam. As a semiconductor material advantageously an indium alloy and as a doping material selenium or tellurium can be used. For the manufacturing of a respective optical storage medium a sputtering method for depositing the doped semiconductor material as the mask layer can be used, wherein the dopant is included already in the semiconductor sputtering target. |
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Bibliography: | Application Number: KR20097006650 |