REFLECTIVE TYPE EUV BLANK MASK AND PHOTOMASK AND MANUFACTURING METHOD THEREOF

• Main Authors: KIM, SE WOON, KANG, HYOUNG JONG, CHA, HAN SUN, NAM, KEE SOO, RYU, GI HUN
• Format: Patent
• Language: English
• Published: 25.05.2009
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES