A METHOD FOR REGENERATING REMOVAL LIQUID FROM REMOVAL LIQUID WASTE LIQUID, AND A REGENERATING APPARATUS

A method for regenerating stipper solution from waste stipper solution, and a regenerating apparatus thereof are provided to prevent the precipitation of resist and to improve the recovery rate of the purfied stripper solution. A method for regenerating stipper solution comprises a step of removing...

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Bibliographic Details
Main Authors TAKEYAMA TOMOKIYO, KONO MASAFUMI, ODA AKIYOSHI, KAWASE YASUHITO, MIZUTANI EIICHI
Format Patent
LanguageEnglish
Published 30.04.2009
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A method for regenerating stipper solution from waste stipper solution, and a regenerating apparatus thereof are provided to prevent the precipitation of resist and to improve the recovery rate of the purfied stripper solution. A method for regenerating stipper solution comprises a step of removing positive type photoresist contained in the waste stipper solution and reproducing the stipper solution by adding an alkaline compound of 0.01~0.2 times mass based on the photoresist mass contained in the waste resist stipper solution generated in a manufacturing process of LCD panel.
Bibliography:Application Number: KR20080104730