MASK BLANK MANUFACTURING METHOD AND COATER

• Main Authors: MIYATA RYOJI, ASAKAWA KEISHI
• Format: Patent
• Language: English
• Published: 12.01.2009
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

A method for preparing a microblank, and a coating device are provided to control the liquid level of a resist agent in bath to be constant, thereby improving the uniformity of the thickness of a coating film in a substrate. A method for preparing a microblank comprises the steps of contacting a res...