MASK BLANK MANUFACTURING METHOD AND COATER

A method for preparing a microblank, and a coating device are provided to control the liquid level of a resist agent in bath to be constant, thereby improving the uniformity of the thickness of a coating film in a substrate. A method for preparing a microblank comprises the steps of contacting a res...

Full description

Saved in:
Bibliographic Details
Main Authors MIYATA RYOJI, ASAKAWA KEISHI
Format Patent
LanguageEnglish
Published 12.01.2009
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:A method for preparing a microblank, and a coating device are provided to control the liquid level of a resist agent in bath to be constant, thereby improving the uniformity of the thickness of a coating film in a substrate. A method for preparing a microblank comprises the steps of contacting a resist agent which passed through a nozzle(22) from the liquid bath(20) accommodating a liquid resist agent to reach the front aperture part of a nozzle, to the surface of a substrate having a thin film for the formation of a transfer pattern; relatively moving the substrate and the nozzle to coat the resist agent on the surface of a substrate, wherein the liquid level of the resist agent in the liquid bath is maintained to be constant during the coating process of the resist agent on the surface of a substrate.
Bibliography:Application Number: KR20080061683