PROJECTION OPTICAL SYSTEM AND EXPOSURE APPARATUS

A projection optical system and an exposure apparatus are provided to transfer the pattern onto the substrate by scanning the mask and the substrate at the same time. A projection optical system comprises the first concave reflection side(M1), and the convex reflecting surface(M2) and the second con...

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Bibliographic Details
Main Author FUKUOKA RYOUSUKE
Format Patent
LanguageEnglish
Published 21.11.2008
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A projection optical system and an exposure apparatus are provided to transfer the pattern onto the substrate by scanning the mask and the substrate at the same time. A projection optical system comprises the first concave reflection side(M1), and the convex reflecting surface(M2) and the second concave reflection side(M3) are arranged in the optical path to the upper side from the object plane in an order; the projection optical system having the good image area of the zone shape of the limited range in the off-axis; the bending optical member having the power at the intervals between the convex reflecting surface and the first concave reflection side, the second concave reflection side and convex reflecting surface. The total power of the reflection optic member included in the projection optical system is phi1.
Bibliography:Application Number: KR20080044230