TEMPERATURE CONTROL METHOD, TEMPERATURE CONTROLLER, AND HEAT TREATMENT APPARATUS

A temperature control method, a temperature controller, and a heat treatment apparatus are provided to adjust a common target time by suppressing a variation in each of processing units. A temperature control method includes a process for controlling temperature of a heating plate to form the measur...

Full description

Saved in:
Bibliographic Details
Main Authors OOKURA JUN, NAKAYAMA HISAKAZU, SEKIMOTO EIICHI
Format Patent
LanguageEnglish
Published 13.08.2008
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:A temperature control method, a temperature controller, and a heat treatment apparatus are provided to adjust a common target time by suppressing a variation in each of processing units. A temperature control method includes a process for controlling temperature of a heating plate to form the measured temperature corresponding to the target temperature by measuring the temperature of the heating plate. A data acquisition process is performed to obtain control data related to a required time necessary for adjusting the temperature of the heating plate from the first temperature as the initial temperature to the second temperature as the target temperature. The substrate is processed on the basis of the obtained control data. The target temperature is controlled after controlling the target temperature.
Bibliography:Application Number: KR20080010931