METHOD OF FABRICATING SEMICONDUCTOR DEVICE

• Main Authors: YOON, JIN YOUNG, KIM, HYUN WOO, JANG, YUN KYEONG, KANG, YOOL, YI, SHI YONG, CHOI, SANG JUN
• Format: Patent
• Language: English
• Published: 16.07.2008
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A method for manufacturing a semiconductor device is provided to obtain 1/2 pitch of a first pattern by using a self-alignment method in a post-process. A hard mask layer(130) and a photoresist pattern including silicon are formed on a target layer(120). An oxide layer pattern(160) is formed on a la...