DECOMPRESSION DRYING DEVICE

A decompression drying device is provided to prevent effectively residues of a coating layer on a substrate by modifying a composition thereof. A chamber(106) includes a space for receiving a substrate in a horizontal state. A first exhaust unit exhausts the space of the chamber in a drying process....

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Bibliographic Details
Main Authors TAKAHIRO SAKAMOTO, MITSUHIRO SAKAI, SHUNICHI YAHIRO
Format Patent
LanguageEnglish
Published 26.06.2008
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A decompression drying device is provided to prevent effectively residues of a coating layer on a substrate by modifying a composition thereof. A chamber(106) includes a space for receiving a substrate in a horizontal state. A first exhaust unit exhausts the space of the chamber in a drying process. A stage(122) includes an upper surface on which the substrate is loaded. The stage further includes a plurality of gas injection holes for injecting gas to float the substrate from the upper surface of the stage. A gas supply unit(136) inserts gas lines into the gas injection holes to supply the gas to float the substrate. A second exhaust unit exhausts the gas lines in a vacuum exhaust manner. The gas lines are connected to the second exhaust unit and is loaded on the upper surface of the stage during the drying process. The gas lines are connected to the gas supply unit during a substrate transferring process.
Bibliography:Application Number: KR20070134928