MULTIPLE LOCATION ILLUMINATION SYSTEM AND PROJECTION DISPLAY SYSTEM EMPLOYING SAME
An illumination system is disclosed for use with an array of imaging mirrors such as in a projection imaging system. The projection imaging system includes projection optics and first and second light source assemblies located in first and second illumination locations. The imaging mirrors are indiv...
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Main Author | |
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Format | Patent |
Language | English |
Published |
12.02.2008
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Subjects | |
Online Access | Get full text |
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Summary: | An illumination system is disclosed for use with an array of imaging mirrors such as in a projection imaging system. The projection imaging system includes projection optics and first and second light source assemblies located in first and second illumination locations. The imaging mirrors are individually controllable between first and second different reflecting states to form an image, the first reflecting state causing light from the first illumination location to be reflected to the projection optics and the second reflecting state causing light from the second illumination location to be reflected to the projection optics. |
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Bibliography: | Application Number: KR20077028995 |