MASKING DWVICE FOR RADIATION DETECTOR PANEL

• Main Authors: KIM, KYOUNG JIN, SHIN, JUNG WOOK, CHA, BYUNG YOUL, NAM, SANG HEE, CHOI, JANG YONG, KIM, SO YOUNG, YOON, KYOUNG JUN, PARK, JI KOON, PARK, SUNG KWANG, KANG, SANG SIK, CHO, SUNG HO
• Format: Patent
• Language: English
• Published: 27.12.2007
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MEASUREMENT OF NUCLEAR OR X-RADIATION; MEASURING; PHYSICS; SEMICONDUCTOR DEVICES; TESTING; X-RAY TECHNIQUE

A deposition mask for manufacturing a radiation detector panel is provided to prevent a photo conductive material from permeating into an inactive region of a TFT by applying a silicon bond at an interface between a TFT array panel and a metal mask. A cover mask(5) is arranged in an inactive region, so that a photo conductive material is deposited in an active region except for an electrical contact portion. The cover mask is fixed by using a silicon bond for preventing gas molecules from permeating into the inactive region of a TFT(Thin Film Transistor) array panel(4). An upper mask(10) is laminated on the cover mask to seal the TFT array panel. An inner edge of the cover mask has an angle for preventing a deposition surface from being damaged when separating the cover mask from the TFT array panel after a deposition process is completed.