ELECTRON-EMISSION SOURCE AND FIELD EMISSION DISPLAY USING THE SAME
An electron emission source and a field emission display using the electron emission source are provided to increase an aspect ratio and electric field by using a DLC(Diamond-Like Carbon) film layer. An electron emission source is comprised of a substrate and a film structure deposited on the substr...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
24.12.2007
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Subjects | |
Online Access | Get full text |
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Summary: | An electron emission source and a field emission display using the electron emission source are provided to increase an aspect ratio and electric field by using a DLC(Diamond-Like Carbon) film layer. An electron emission source is comprised of a substrate and a film structure deposited on the substrate. The film structure is made of a DLC film layer(31). The film structure of the DLC film layer is arranged on the substrate to configure a petal shape. A lateral height of the film structure is from 0.5 to 4.0mum. The substrate is made of a semiconductor material, a metal material, an insulation material, or a glass material. The film structure is a curved film structure, a long-strip film structure, or a combination thereof. A thickness of the film structure is 0.005 to 0.1mum. |
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Bibliography: | Application Number: KR20070002365 |