SURFACE TREATMENT METHOD OF ITO USING OXYGEN PLASMA AND THERMAL TREATMENT AND OLED DEVICE USING THE SAME METHOD

An ITO(Indium Tin Oxide) surface treatment method using an oxygen plasma and an OLED device using the same are provided to enhance an absorption property of oxygen by accelerating a reaction speed of an oxygen plasma process. A multilayer OLED(Organic Light Emitting Device) includes an anode(2), a f...

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Bibliographic Details
Main Authors LEE, JAE WON, JANG, SUN GI, CHAE, HEE YEOP, JEONG, DONG HUN
Format Patent
LanguageEnglish
Published 05.10.2007
Subjects
ELECTRIC HEATING
ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
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Summary:An ITO(Indium Tin Oxide) surface treatment method using an oxygen plasma and an OLED device using the same are provided to enhance an absorption property of oxygen by accelerating a reaction speed of an oxygen plasma process. A multilayer OLED(Organic Light Emitting Device) includes an anode(2), a first region(3), an HTL(Hole Transport Layer)(4), an EML(Emitting Layer)(5), a buffer layer(6), and a cathode(7). An oxygen plasma thermal treatment is performed on the first region on an ITO. Holes are transferred in the HTL. Holes are combined with electrons in the EML. The cathode is made of aluminum. A transparent material is used for forming one electrode of a substrate, such that the light is emitted from the OLED. The transparent material is used as the anode, which injects the holes. The HTL is made of TPD(Triphenyl Diamine).
Bibliography:Application Number: KR20060029823