N-TYPE SEMICONDUCTOR MATERIALS FOR THIN FILM TRANSISTORS

A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide 3,4,9,10-perylene-based compound having, attached to each of the imide nitrogen atoms a substituted or unsubsitituted phenylalkyl group. Such transistors can further comprise spaced apart...

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Bibliographic Details
Main Authors NELSON SHELBY FORRESTER, FREEMAN DIANE CAROL, SHUKLA DEEPAK
Format Patent
LanguageEnglish
Published 01.10.2007
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Summary:A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide 3,4,9,10-perylene-based compound having, attached to each of the imide nitrogen atoms a substituted or unsubsitituted phenylalkyl group. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation or solution-phase deposition onto a substrate, wherein the substrate temperature is no more than 100°C.
Bibliography:Application Number: KR20077013932