N-TYPE SEMICONDUCTOR MATERIALS FOR THIN FILM TRANSISTORS
A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide 3,4,9,10-perylene-based compound having, attached to each of the imide nitrogen atoms a substituted or unsubsitituted phenylalkyl group. Such transistors can further comprise spaced apart...
Saved in:
Main Authors | , , |
---|---|
Format | Patent |
Language | English |
Published |
01.10.2007
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide 3,4,9,10-perylene-based compound having, attached to each of the imide nitrogen atoms a substituted or unsubsitituted phenylalkyl group. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation or solution-phase deposition onto a substrate, wherein the substrate temperature is no more than 100°C. |
---|---|
Bibliography: | Application Number: KR20077013932 |