METHOD OF MANUFACTURING A MEMORY DEVICE
A gas distribution plate for uniform injection of gas is provided to improve a process nonuniformity phenomenon where the center part of a substrate becomes thicker than the peripheral part of the substrate, by increasing the fluid conductance in the peripheral part of a gas distribution plate as co...
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Main Authors | , , , , , , , |
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Format | Patent |
Language | English |
Published |
11.09.2007
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Subjects | |
Online Access | Get full text |
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Summary: | A gas distribution plate for uniform injection of gas is provided to improve a process nonuniformity phenomenon where the center part of a substrate becomes thicker than the peripheral part of the substrate, by increasing the fluid conductance in the peripheral part of a gas distribution plate as compared with the center part of the gas distribution plate. A predetermined reaction space is formed in a chamber, and a plurality of injection holes for injecting gas over a substrate placement table are formed in a gas distribution plate(100). A first region is formed in the center of the gas distribution plate. A second region is formed outside the first region. The fluid conductance in the first region is lower than that in the second region. The density of the injection hole in the first region can be lower than that in the second region. |
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Bibliography: | Application Number: KR20060021023 |