WASHING APPARATUS FOR WAFER AND FABRICATION EQUIPMENT FOR SEMICONDUCTOR DEVICE HAVING THE SAME

• Main Author: KIM, TAE BONG
• Format: Patent
• Language: English
• Published: 24.07.2007
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

An apparatus for cleaning a wafer is provided to avoid a wafer loss and prevent particles from being generated by a contact between a holder of a cleaning/drying part and a support cap of a wafer transfer part by minimizing the contact between the holder and the support cap. A wafer having undergone a semiconductor device fabricating process is cleaned by a cleaning part. A wafer transfer part(420) includes a plurality of rollers(411) for transferring the cleaned wafer, a support part(421) for supporting the rollers, and a support cap(423) that is formed atone one end of the support part to fix the rollers and the support part. A cleaning/drying part(400) fixes the wafer transferred by the wafer transfer part to a plurality of holders(435) to clean and dry the wafer, positioned under the wafer transfer part. The support cap rises from a portion under the wafer transfer part to be prevented from coming in contact with the holder that fixes the transferred wafer to the cleaning/drying part. A region of the support cap adjacent to the holder can be thinner than the other region.