LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURING A DEVICE

• Main Authors: LEVASIER LEON MARTIN, LOOPSTRA ERIK ROELOF, SENGERS TIMOTHEUS FRANCISCUS, BECKERS MARCEL, VAN EMPEL TJARKO ADRIAAN RUDOLF, VAN DEN SCHOOR LEON JOSEPH MARIE, VAN ASTEN NICOLAAS ANTONIUS ALLEGONDUS JOHANNES, BOX WILHELMUS JOSEPHUS, VAN LOENHOUT ELKE, OUWEHAND LUBERTHUS, MUITJES MARCEL JOHANNUS ELISABETH HUBERTUS, JANSEN ROB
• Format: Patent
• Language: English
• Published: 27.06.2007
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A lithography apparatus and a method for manufacturing a device are provided to measure an aspect and characteristic of a substrate and to supply a conditioning fluid by using a measuring system and a conditioning system. A substrate table(WT) supports a substrate. The substrate table moves between a substrate measuring position and a substrate process position to transfer the substrate. Measuring systems(10,11,12) measure one or more aspects and/or characteristics of the substrate when the substrate table supports the substrate at the substrate measuring position. The measuring systems discharge one or more measuring beams(8,9) and fields toward the surface of the substrate. A projecting system projects a patterned radiation beam to a target unit of the substrate when the substrate table supports the substrate at the substrate process position. A conditioning system(4) supports conditioning fluid to the whole or a part of a path in order to the path of the measuring mean and/or the field of the measuring system.