PLASMA TREATMENT APPARATUS AND METHOD OF PLASMA TREATMENT

The functional deterioration of plasma treatment apparatus attributed to a reduction of plasma generation chamber caused by reducing plasma produced from introduced process gas is prevented to thereby realize prolongation of the service life of members brought into contact with reducing plasma, such...

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Bibliographic Details
Main Author YAMAZAKI KATSUHIRO
Format Patent
LanguageEnglish
Published 12.06.2007
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:The functional deterioration of plasma treatment apparatus attributed to a reduction of plasma generation chamber caused by reducing plasma produced from introduced process gas is prevented to thereby realize prolongation of the service life of members brought into contact with reducing plasma, such as plasma generation chamber members. In one embodiment, there is provided a plasma treatment apparatus capable of treating the surface of treatment subject (S) by means of radicals produced by excitation of process gas, wherein plasma generation chamber member (6) having plasma generation chamber (6a) created thereinside is connected to gas introduction pipe (5) disposed outside processing chamber (1) and wherein the plasma generation chamber member (6) at its end is fitted with gas control unit (7). It is so constructed that when the plasma generation chamber member (6) is reduced by reducing plasma produced from gas introduced from the gas control unit (7), the gas control unit (7) introduces re-oxidation gas in place of reducing gas into the plasma generation chamber (6a).
Bibliography:Application Number: KR20077007277