RETICLE ARM AND EXPOSURE APPARATUS HAVING THE SAME

• Main Authors: KIM, MI YOUN, BAE, YONG KUG, KO, YONG SUN, YOON, KYUNG SUN
• Format: Patent
• Language: English
• Published: 18.12.2006
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

A reticle arm and an exposure apparatus having the same are provided to reduce a time for preparing reticle by loading and arranging a plurality of reticles on a plurality of reticle arms. A reticle arm includes a first connection part(1410), a supporting part(1420), and a second connection part(143...