RETICLE ARM AND EXPOSURE APPARATUS HAVING THE SAME

A reticle arm and an exposure apparatus having the same are provided to reduce a time for preparing reticle by loading and arranging a plurality of reticles on a plurality of reticle arms. A reticle arm includes a first connection part(1410), a supporting part(1420), and a second connection part(143...

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Bibliographic Details
Main Authors KIM, MI YOUN, BAE, YONG KUG, KO, YONG SUN, YOON, KYUNG SUN
Format Patent
LanguageEnglish
Published 18.12.2006
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A reticle arm and an exposure apparatus having the same are provided to reduce a time for preparing reticle by loading and arranging a plurality of reticles on a plurality of reticle arms. A reticle arm includes a first connection part(1410), a supporting part(1420), and a second connection part(1430). The first connection part is connected with a rail. The supporting part is connected with the first connection part. The second connection part is projected from the supporting part and is fixed to a lateral face of the reticle. The second connection part and the supporting part are integrated. The second connection part is inserted into a concave part which is formed on the lateral face of the reticle.
Bibliography:Application Number: KR20050050419